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A binary Mask is also known as a bipolar mask, which is widely used from 365nm (I-line) to 193nm (ArF) in the photolithography. Binary Mask can cover process nodes of 130nm and above.

Optical Proximity Correction (OPC) is a technology of optical resolution enhancement. At present, we can apply a number of OPC technologies, and closely cooperate with customers to develop OPC masks in line with process requirements.

Phase Shift Mask（PSM）generates a 180°phase difference through the MOSI layer, which can reduce the diffraction effect of the light, increase the resolution of the mask graphic, and increase the focal depth. We will cooperate closely with customers to further develop PSM masks that meet the requirements.